Basic Info.
Product Description
1. Name: 99.9% Purity Titanium Nitride(TiN) Sputtering Target Ceramic Target
2. Size: 1-8inch, customized
3. Purity: 99.9%
4. Certification: ISO9001, SGS, CTI, ROHS
| Product Name | 99.9% Purity Titanium Nitride(TiN) Sputtering Target Ceramic Target |
| Material | Titanium Nitride |
| Color | Brown |
| Size | 1-8inch, as request |
| Purity | 99.9% |
| Keyword | Titanium Nitride Sputtering Target |
| Technics | Powder metallurgy |
| Used | Semiconductor, PVD, CVD. |
Size: Dia 2" x 3~6mm th ,Dia 3" x 3~6mm th ,according to customer's requirements
Product display
| Quality Standard (99.9) | ||||||
| Element | Valu(<Ppm) | Element | Valu(<Ppm) | Element | Valu(<Ppm) | |
| Al | 25 | Mg | 2 | Si | 25 | |
| B | 0.5 | Mn | 20 | Ta | 1 | |
| Bi | 1 | Mo | 10 | Ti | 20 | |
| C | 20 | N | 5 | U | 2 | |
| Cd | 2.5 | Nb | 50 | W | 20 | |
| Cr | 30 | Ni | 25 | Zr | 0.1 | |
| Co | 5 | O | 50 |
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| Fe | 95 | P | 10 |
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| Product | Sign | Purity | Form | Spec |
| High purity TiN szzzyj.en.made-in-china.com |
| 3N5, 4N | Sputtering targets | 50.8*5mm etc |
| 3N5, 4N | Rod | Dia2*5mm | ||
| 3N5, 4N | Wire | Dia0.1-Dia5mm | ||
| 3N5, 4N | Sheet | 0.03-10mm thickness | ||
| 3N5, 4N | Granules | 1-5mm | ||
| 3N5, 4N | Powder | -200mesh etc |
Producing high density and high purity Ceramic sputtering targets for research with custom sizes and custom compositions is our advantage. All targets are analyzed using best demonstrated techniques including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS) and Inductively Coupled Plasma (ICP).
Below is a list we offer which is not exhaustive but just a sample - if you do not see something particular please contact us to request a quote directly.
| Formula | Oxide Target | Purity | Formula | Ceramic Target | Purity |
| Al2O3 | Aluminium Oxide | 2N-4N | AlN | Aluminum Nitride | 4N |
| AZO | Aluminum Zinc Oxide | 4N | B4C | Boron Carbide | 2N5 |
| BaTiO3 | Barium Titanate | 4N | Bi2Te3 | Bismuth Telluride | 4N |
| CeO2 | Cerium Oxide | 4N | BN | Boron Nitride | 3N |
| CuO | Copper Oxide | 3N | CIGS | CuInGaSe | 4N |
| Fe2O3 | Ferric Oxide | 3N-3N5 | CIS | CuInSe | 4N |
| HfO2 | Hafnium Oxide | 4N | Cu2S | Cuprous Sulfide | 4N 5N |
| In2O3 | Indium Oxide | 4N | CZTS | CuZnSnS | 4N |
| MgO | Magnesium Oxide | 4N | MgF2 | Magnesium Fluoride | 4N |
| MnO2 | Manganese Dioxide | 3N | Si3N4 | Silicon Nitride | 3N |
| MoO3 | Molybdenum Trioxide | 4N | SiC | Silicon Carbide | 3N |
| Nb2O5 | Niobium Pentoxide | 4N | SnS2 | Tin Disulfide | 4N 5N |
| NiO | Nickel Oxide | 3N | TiB2 | Titanium Diboride | 2N5 |
| SiO2 | Silicon Dioxide | 4N 5N | TiC | Titanium Carbide | 3N |
| SnO2 | Tin Dioxide | 4N | TiN | Titanium Nitride | 3N |
| Ta2O5 | Tantalum Pentoxide | 4N | YbF3 | Ytterbium Fluoride | 4N-5N |
| TiO2 | Titanium Dioxide | 4N | YF3 | Yttrium Fluoride | 4N |
| V2O5 | Vanadium Pentoxide | 4N | ZnS | Zinc Sulfide | 4N |
| WO3 | Tungsten Trioxide | 4N | ZnSe | Zinc Selenide | 4N |
| ZnO | Zinc Oxide | 4N-5N | ZnTe | Zinc Telluride | 4N |
| ZrO2 | Zirconium Oxide | 4N | ZrB2 | Zirconium Boride | 3N |
| GZO | Gallium Zinc Oxide | 4N | LiCoO2 | Lithium Cobaltate | 3N |
| ITO | Indium Tin Oxide | 4N | SrRuO3 | Strontium Ruthenate | 3N |
| IZO | Indium Zinc Oxide | 4N | SrTiO3 | Strontium Titanate | 3N |
Our sputtering targets mainly consist of pure metals and alloys, available in both planar and rotatable shapes.
Featured targets from Rhexon:
1.Pure Metal:
Ti, Zr, Ta, Nb, Mo, W, Ni, Cr, Al, Zn, Si, Cu,ITO,AZO.TZO,WC,Nb2O5,TiO2, SiO2 with planar and rotary type.,
2.Typical alloy target :
1) Ti/Al alloy target (67:33,50:50at%)
2) W/Ti alloy target (90:10wt%),
3) Ni/V alloy target (93:7,wt%)
4) Ni/Cr alloy target (80:20, 70:30,wt%),
5) Al/Cr alloy target (70:30,50:50at%)
6) Nb/Zr alloy target (97:3,90:10wt%
7) Si/Al alloy target (90:10,95:5,98:2,70:30,wt%)
8) Zn/Al alloy
9)Pure Cr target (99.95%, 99.995%)
10)Al/Cr alloy target (70:30, 50:50,15:85,67:33,wt%and at%)
11) Ni/Cu alloy target (70:30,80:20,wt%)
12)Al/Nd alloy target (98:2wt%)
13)Mo/Nb alloy target (90:10,wt%)
14)TiAlSi alloy target (Ti/Al/Si=30/60/10, 33/67, 40/50/10 ,wt% and at%)
15)CrAlSi alloy target (Cr/Al/Si=30/60/10 ,wt% and at%)and so on, and help set of target material
Certification report
Contact us
CENTRE METALLURGY TECH LTD
TEL:0086-755-27426325 +86-15014149381
Website:http://szzzyj.en.made-in-china.com , https://szzzyj.en.made-in-china.com/