Our factory supply high quality Al2O3, SiO2, Si3N4, SiC, Nb2Ox, TiOx, ITO, AZO sputtering targets, as well as many other compound materials. As ceramic sputtering targets are very fragile with very bad thermal conductivity, so usually it will be bonded with copper backing plate by indium or elastomer, to prolong service time.

Sintering technology are used  to produce ceramic sputtering targets, the shape can be round and rectangle.For round target,the diameter can be 1" to 14" , while thickness can be 3mm to 6.35mm, special size can be customized. For rectangle target, monolithic or several tiles construction will be supplied depending on the size.

Features

Chemical Composition: In2O3/SnO2 90/10wt%

Available Purity: 4N

Production Technology: Powder Metallurgy

Shapes: planar targets, rotary targets

Relative density: ≥99.3%

Resistivity: ≤1.8Ω·mm2/m

Deoxygenation Coefficient: ≤0.5%

Available size: round target, diameter ≤ 16", rectangle target, according to your requirement

Indium bonding is recommended for this materials

Advantages: uniform color, smooth surface, no cracks, no chipping, no foreign inclusions and contaminants. 

Application: transparent conducting film

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